Plasma etching is a cornerstone technique in semiconductor fabrication, enabling the precise removal of material layers through the use of ionised gases. This process is essential for fabricating ...

Imagine trying to carve a tiny, complex sculpture into a block the size of your fingernail again and again, billions of times, with nearly no room for error. That’s ...

A large-scale (4-inch), highly uniform, and defect-free plasma etching technology, which will likely become the foundation of the industrial supply of molybdenum disulfide (MoS₂), a next-generation ...

Mass spectrometry, by contrast, is a powerful technique for the analysis of any process gas. Careful consideration of differences in pressure, reaction time scales and process flow is essential for ...

At the forefront of Europe’s photonics innovation, TNO is building a state-of-the-art pilot line for Indium Phosphide (InP) photonic chips at the High Tech Campus in Eindhoven. As part of the ...